Genes: 2D process simulator for Silicon/SiC devices

Genes is a smart 2D process simulator for Silicon/SiC devices. It simulates standard process simulation steps including etching, deposition, ion implantation, diffusion, oxidation, epi and silicidation.

Robust Geometry

  • Efficient and Robust 2D geometry kernel
  • use exact math to avoid any numerical rounding error
  • Support point, line segment, polygon
  • fast line intersection and polygon booling operation

Adaptive Mesh

High quality quadtree based mesh

quadtree as background mesh,with special process at boundary

advantage:

  • efficient for adaptive refinement
  • friendly for interpolation

Flexable PDE solver

  • Suitable for diffusion PDE
  • With parallel support

Etch

Support various etch model:

  • isotropic
  • anisotropic
  • crysal orientated
  • axis orientated
  • trapezoidal
  • Poly
  • CMP

Deposit

Support various deposit model:

  • isotropic
  • anisotropic
  • crysal orientated
  • axis orientated
  • Poly
  • CMP

Implant

Analytic Ion implantation

  • Dopant Profile as Ion energy, dose, tilt angle, rotation angle, as well as screen oxide
  • Damage based on Hobler Model
  • Implant table calibratedwith MC
  • Support Parallel speedup

Diffusion

Sophisticated diffusion solver

  • Flexible PDE framework
  • Fermi, 3-stream and 5-stream model with cluaster support
  • Support Calibration
  • Support Parallel speedup

Oxidation

Advanced Oxidation Solver

  • Various oxidation model
  • Kinetic mesh motion support
  • Support Calibration
  • Support Parallel speedup

STI

STI bulider

  • Create STI by parameters