Genes: 2D process simulator for Silicon/SiC devices
Genes is a smart 2D process simulator for Silicon/SiC devices. It simulates standard process simulation steps including etching, deposition, ion implantation, diffusion, oxidation, epi and silicidation.
Robust Geometry
- Efficient and Robust 2D geometry kernel
- use exact math to avoid any numerical rounding error
- Support point, line segment, polygon
- fast line intersection and polygon booling operation
Adaptive Mesh
High quality quadtree based mesh
quadtree as background mesh,with special process at boundary
advantage:
- efficient for adaptive refinement
- friendly for interpolation
Flexable PDE solver
- Suitable for diffusion PDE
- With parallel support
Etch
Support various etch model:
- isotropic
- anisotropic
- crysal orientated
- axis orientated
- trapezoidal
- Poly
- CMP
Deposit
Support various deposit model:
- isotropic
- anisotropic
- crysal orientated
- axis orientated
- Poly
- CMP
Implant
Analytic Ion implantation
- Dopant Profile as Ion energy, dose, tilt angle, rotation angle, as well as screen oxide
- Damage based on Hobler Model
- Implant table calibratedwith MC
- Support Parallel speedup
Diffusion
Sophisticated diffusion solver
- Flexible PDE framework
- Fermi, 3-stream and 5-stream model with cluaster support
- Support Calibration
- Support Parallel speedup
Oxidation
Advanced Oxidation Solver
- Various oxidation model
- Kinetic mesh motion support
- Support Calibration
- Support Parallel speedup
STI
STI bulider